Diffractive optics fabrication is performed by two complementary processing
methods that rely on the photoablation of materials by ultrashort UV laser
pulses. The spatially selective ablation of materials permits the direct m
icroetching of high-quality surface-relief patterns. In addition, the direc
t, spatially selective transfer of the ablated material onto planar and non
planar receiving substrates provides a complementary microprinting operatio
n. The radiation from the ultrashort pulsed excimer laser results in superi
or quality at relatively low-energy density levels, owing to the short abso
rption length and minimal thermal-diffusion effects. Computer-generated hol
ographic structures are produced by both modes of operation. Submicrometer
features, including Bragg-type structures, are microprinted onto planar and
high-curvature optical-fiber surfaces, demonstrating the unique ability of
the schemes for complex microstructure and potentially nanostructure devel
opment. (C) 1999 Optical Society of America.