R. Birkhahn et al., Red light emission by photoluminescence and electroluminescence from Pr-doped GaN on Si substrates, APPL PHYS L, 74(15), 1999, pp. 2161-2163
Visible light emission has been obtained at room temperature by photolumine
scence (PL) and electroluminescence (EL) from Pr-doped GaN thin films grown
on Si(111). The GaN was grown by molecular beam epitaxy using solid source
s (for Ga and Pr) and a plasma gas source for N-2. Photoexcitation with a H
e-Cd laser results in strong red emission at 648 and 650 nm, corresponding
to the transition between P-3(0) and F-3(2) states in Pr3+. The full width
at half maximum (FWHM) of the PL lines is similar to 1.2 nm, which correspo
nds to similar to 3.6 meV. Emission is also measured at near-infrared wavel
engths, corresponding to lower energy transitions. Ar laser pumping at 488
nm also resulted in red emission, but with much lower intensity. Indium-tin
-oxide Schottky contacts were used to demonstrate visible red EL from the G
aN:Pr. The FWHM of the EL emission line is similar to 7 nm. (C) 1999 Americ
an Institute of Physics. [S0003-6951(99)00315-0].