Photoconductive detectors based on partially ordered AlxGa1-xN alloys grown by molecular beam epitaxy

Citation
M. Misra et al., Photoconductive detectors based on partially ordered AlxGa1-xN alloys grown by molecular beam epitaxy, APPL PHYS L, 74(15), 1999, pp. 2203-2205
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
74
Issue
15
Year of publication
1999
Pages
2203 - 2205
Database
ISI
SICI code
0003-6951(19990412)74:15<2203:PDBOPO>2.0.ZU;2-2
Abstract
Photoconductive detectors based on partially ordered AlxGa1-xN alloys with AlN mole fractions up to 45% were fabricated and evaluated. The degree of o rdering in these alloys was found to increase with the AlN mole fraction an d it has a maximum value at about 50%. The resistivity of the AlxGa1-xN fil ms was found to increase from 10 to 10(8) Ohm cm by increasing the Al conte nt in the films. Correspondingly, the mobility-lifetime (mu tau) product, w hich was determined by measuring the photoconductive gain, was found to dec rease from 10(-2) to 10(-5) cm(2)/V. These high values of the mu tau produc t at the high AlN mole fraction are attributed to spatial separation and in direct recombination of the photogenerated electron hole pairs, due to band -gap misalignment of the ordered and disordered domains in these films. (C) 1999 American Institute of Physics. [S0003-6951(99)02815-6].