Electrodeposited spin valves on n-type GaAs

Citation
K. Attenborough et al., Electrodeposited spin valves on n-type GaAs, APPL PHYS L, 74(15), 1999, pp. 2206-2208
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
74
Issue
15
Year of publication
1999
Pages
2206 - 2208
Database
ISI
SICI code
0003-6951(19990412)74:15<2206:ESVONG>2.0.ZU;2-8
Abstract
Soft switching, spin-valve Co/Cu heterostructures have been electrodeposite d onto n-type (100) GaAs. A symmetric spin-valve configuration is used whic h incorporates an artificially hard substructure. A magnetoresistance chang e of up to 5.4% is observed with sensitivities up to 0.55% per Oersted and a saturation field of 100 Oe, the highest sensitivity so far observed in el ectrodeposited structures. The magnetoresistance measurements show a double switching step which we conclude is due to the free layers having differin g coercivities. The Co/GaAs interface induces an in-plane anisotropy in the films which is responsible for these remarkable spin-valve properties. (C) 1999 American Institute of Physics. [S0003-6951(99)00915-8].