Patterning neuronal and glia cells on light-assisted functionalised photoresists

A common photosensitive polymeric material used in semiconductor microlitho graphy (diazo-naphto-quinone/novolak resist) was pattern-exposed with near- UV light to create carboxylic-rich areas on the polymer surface. The patter ned surfaces were further functionalised via: (1) the anchorage of peptides for specific cell-attachment or cell-detachment functions; or (2) the diff usion of silicon rich chemical species to achieve the cell detachment. Pair s of antagonistic surface characteristics controlled the cell attachment: ( 1) amino-rich or carboxylic-rich surfaces; and (2) hydrophilic or hydrophob ic surfaces; in which the former promoted the adhesion. It was found that c ommon microlithographic materials and techniques can be upgraded to allow a n effective control of the lateral organisation of the artificial arrays of neuronal and glia cells. (C) 1999 Elsevier Science S.A. All rights reserve d.