Room temperature laser operation of bulk InGaAsN/GaAs structures grown by AP-MOVPE using N-2 as carrier gas

Citation
A. Ougazzaden et al., Room temperature laser operation of bulk InGaAsN/GaAs structures grown by AP-MOVPE using N-2 as carrier gas, ELECTR LETT, 35(6), 1999, pp. 474-475
Citations number
6
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
ELECTRONICS LETTERS
ISSN journal
00135194 → ACNP
Volume
35
Issue
6
Year of publication
1999
Pages
474 - 475
Database
ISI
SICI code
0013-5194(19990318)35:6<474:RTLOOB>2.0.ZU;2-4
Abstract
Long wavelength bulk InGaAsN semiconductor laser structures have been grown on GaAs substrate by AP-MOVPE, using DMHY and TBAs. After thermal annealin g, GaAs/InGaAsN, and AlGaAs/InGaAsN Fabry-Perot laser diodes were processed from the wafers. At room temperature, stimulated emission was observed at peak wavelength from 1.15 to 1.38 mu m, and laser operation was achieved at 1.16 and 1.275 mu m. Infinite current density is extrapolated to 12kA/cm(2 ) for AlGaAs/InGaAsN bull; laser diodes.