Thin film vertical diffraction gratings fabricated using glancing angle deposition

SiO thin film vertical diffraction gratings Fabricated on Si substrates by the use of an advanced glancing angle deposition (GLAD) technique are demon strated. Diffraction gratings with variable groove heights and variable gra ting periods ranging from 100 nm to 10 mu m are fabricated in a one-step de position process. Gratings fabricated with this technique have potential ap plications in integrated photonic devices.