Silica, silicon nitride and oxynitride thin films - An overview of fabrication techniques, properties and applications

Authors
Balland, B Glachant, A
Citation
B. Balland et A. Glachant, Silica, silicon nitride and oxynitride thin films - An overview of fabrication techniques, properties and applications, INSTABILITIES IN SILICON DEVICES, VOL 3, 1999, pp. 3-144
Categorie Soggetti
Current Book Contents
Journal title
INSTABILITIES IN SILICON DEVICES, VOL 3 → ACNP
Year of publication
1999
Pages
3 - 144
Database
ISI
SICI code