The role of sulfur during Mo etching using SF6 and Cl-2 gas chemistries

Authors
Baek, KH Yun, SJ Park, JM Yoon, YS Nam, KS Kwon, KH Kim, CI
Citation
Kh. Baek et al., The role of sulfur during Mo etching using SF6 and Cl-2 gas chemistries, J MAT SCI L, 17(17), 1998, pp. 1483-1486
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS SCIENCE LETTERS
ISSN journal
02618028 → ACNP
Volume
17
Issue
17
Year of publication
1998
Pages
1483 - 1486
Database
ISI
SICI code
0261-8028(19980901)17:17<1483:TROSDM>2.0.ZU;2-0