The photochemistry of CH3OH(a) and CH3O(a) adsorbed on TiO2 and the effect
uf O-2 have been studied by infrared spectroscopy and mass spectrometry. In
the absence of O-2, CH3OH(a) desorbs molecularly, while CH3O(a) decomposes
to form CH2O(g) under UV irradiation. The rate of CH3O(a) decomposition re
aches maximum in the initial stage of UV irradiation and then decreases sig
nificantly. On the other hand, for the reaction in O-2, the behavior of CH3
O(a) depletion upon UV irradiation is very different, giving rise to adsorb
ed HCOO(a) and H2O(a). A radical mechanism is proposed to explain the varia
tion of CH3O(a) depletion upon UV irradiation, the role of O-2, and the for
mation of the reaction products.