Two-photon exposure of photographic film

Citation
Pw. Wu et al., Two-photon exposure of photographic film, J OPT SOC B, 16(4), 1999, pp. 605-608
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Optics & Acoustics
Journal title
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS
ISSN journal
07403224 → ACNP
Volume
16
Issue
4
Year of publication
1999
Pages
605 - 608
Database
ISI
SICI code
0740-3224(199904)16:4<605:TEOPF>2.0.ZU;2-U
Abstract
Photographic film has commonly been exposed by a single-photon absorption m echanism. We determine the conditions for film exposure by direct two-photo n absorption. Using subpicosecond laser pulses, we find that two-photon exp osure for commercial film has a threshold fluence and an intensity of 0.000 8 J/cm(2) and 0.0066 TW/cm(2), respectively, well below the optical damage threshold. Multiphoton photography has the potential for higher spatial res olution and affords an opportunity for three-dimensional image storage. (C) 1999 Optical Society of America [S0740-3224(99)00304-5] OCIS codes: 190.41 80, 110.5200.