Submicron contact printing on silicon using stamp pads

Citation
T. Pompe et al., Submicron contact printing on silicon using stamp pads, LANGMUIR, 15(7), 1999, pp. 2398-2401
Citations number
12
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
LANGMUIR
ISSN journal
07437463 → ACNP
Volume
15
Issue
7
Year of publication
1999
Pages
2398 - 2401
Database
ISI
SICI code
0743-7463(19990330)15:7<2398:SCPOSU>2.0.ZU;2-V
Abstract
Submicron scale microcontact printing of silanes onto silicon wafers is stu died. Silicon microstructures are used as masters to prepare silicone rubbe r stamps, which are found to peel off the master easily even at wedge angle s of 80 degrees if the master has been silanized before. Stripe structures with periodicities down to 200 nm were generated. At these small scales, ca pillary condensation in the wedges of the stamp during the stamping process is difficult to avoid. We demonstrate a novel "stamp pad" technique which allows us to overcome this problem.