Focused ion-beam specimen preparation for atom probe field-ion microscopy characterization of multilayer film structures

Focused ion-beam milling with a sub-10 nm diameter beam of gallium ions has been used to fabricate held-ion specimens from a multilayer film nanostruc ture containing 100 repetitions of a (Cu-2 (nm)/Co-2 (nm)) bilayer deposite d directly onto a planar substrate. Successful field-ion specimen preparati on has allowed the observation of these layers on the atomic scale by both held-ion imaging and atom probe compositional analysis.