The issue of point-defect injection during antimony precipitation in silico
n is addressed in the present investigation. By studying the effect of Sb p
recipitation in an Sb-box distribution on the diffusion of B or Sb in deepe
r-lying spikes it is unambiguously concluded that Si self-interstitials are
injected during the precipitation process. Possible causes of the self-int
erstitial injection are discussed. [S0163-1829(99)09411-4].