Core-level shifts at B- and Al-doped 6H-SiC studied by XPS

Citation
S. Oswald et H. Wirth, Core-level shifts at B- and Al-doped 6H-SiC studied by XPS, SURF INT AN, 27(3), 1999, pp. 136-141
Citations number
27
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
SURFACE AND INTERFACE ANALYSIS
ISSN journal
01422421 → ACNP
Volume
27
Issue
3
Year of publication
1999
Pages
136 - 141
Database
ISI
SICI code
0142-2421(199903)27:3<136:CSABAA>2.0.ZU;2-A
Abstract
Silicon carbide (SiC) as an interesting material for new electronic applica tions was studied with respect to the binding states of doping elements (B, Al)Amorphization due to sputtering and the effect of surface states influe nce the core-level energies measured by SPS. For the comparison of a series of measurements after doping clement implantation and annealing, the use o f the SiC bulk-state energies determined at a fractured SiC sample as a bin ding energy reference is proposed. From the measured binding energy shifts and estimations with the simple model of electronegativity differences, it is found that B and Al after implantation already prefer bondings to carbon and not to Si. Copyright (C) 1999 John Wiley & Sons, Ltd.