Ion-induced sputtering of a metal in the form of large clusters

Citation
Vi. Matveev et al., Ion-induced sputtering of a metal in the form of large clusters, TECH PHYS, 44(3), 1999, pp. 323-327
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
TECHNICAL PHYSICS
ISSN journal
10637842 → ACNP
Volume
44
Issue
3
Year of publication
1999
Pages
323 - 327
Database
ISI
SICI code
1063-7842(199903)44:3<323:ISOAMI>2.0.ZU;2-3
Abstract
A model is proposed for the ion-induced sputtering of a metal in the form o f large clusters with a number of atoms N greater than or equal to 5. The m odel is based on simple physical assumptions and is consistent with experim ent. As an example, calculations are made of the relative cluster yield as a function of the number of atoms in the cluster as a result of the bombard ment of various metals by singly charged 5 keV argon ions. A comparison is made with experimental data. (C) 1999 American Institute of Physics. [S1063 -7842(99)01103-4].