MECHANISM OF THE RF-SPUTTERING OF MIXED OXIDES

New experimental data on the growth mechanisms of multicomponent Fb(Zr ,Ti)O-3, (Ba,Sr)TiO3, and Y-Ba-Cu-O films in an rf discharge plasma ar e presented. An investigation of the spatial distribution of the radia ted intensity of the sputtered particles in the rf plasma during the d eposition of films of these mixed oxides in the epitaxial state reveal s general laws governing their transport from the target to the substr ate, which are stipulated by features of the negative glow of the rf d ischarge. The roles of external and internal parameters are examined f rom the standpoint of describing the mechanisms of the heteroepitaxial growth of mixed oxides. (C) 1998 American Institute of Physics. [S106 3-7842(98)02009-1].