LOW-PRESSURE FLAME DEPOSITION OF NANOSTRUCTURED OXIDE-FILMS

A novel process called low-pressure flame deposition (LPFD), which is designed to deposit nanostructured oxide films at high rates, is descr ibed. The process involves the pyrolysis of chemical precursors in a f lat flame combustor and deposition of an adherent film on suitable sub strates, Films with thicknesses of 0.5-10.0 mu m at rates in excess of 1 mu m/min are formed by condensing nanoparticles from the gas phase and allowing the ''superheated'' particles to sinter on the substrate. Either porous or dense films, with nanoscale features in both cases, are formed by altering the processing parameters such as temperature o f the substrate and the flame temperature profile. The paper describes the processing parameters and microstructures of SiO2 and SnO2 films formed via the LPFD process.