ACTIVELY DEPOSITED CERAMIC LAYERS AS INSULATION ON THIN IMPLANTABLE ELECTRODE CONDUCTORS

Citation
T. Hanekom et al., ACTIVELY DEPOSITED CERAMIC LAYERS AS INSULATION ON THIN IMPLANTABLE ELECTRODE CONDUCTORS, South African journal of science, 94(7), 1998, pp. 310-311
Citations number
6
Categorie Soggetti
Multidisciplinary Sciences
ISSN journal
00382353
Volume
94
Issue
7
Year of publication
1998
Pages
310 - 311
Database
ISI
SICI code
0038-2353(1998)94:7<310:ADCLAI>2.0.ZU;2-E
Abstract
The electrical and chemical insulation of thin platinum wires insulate d with titanium dioxide or alumina was investigated. These non-conduct ing layers were deposited onto wire surfaces using conducting material s in a unique active sputtering process and were evaluated Sor possibl e use as insulation on implantable electrode conductors. The mechanica l properties of the layers were found to be appropriate for the applic ation, although it was not conclusively established whether these ultr a-thin coatings would provide satisfactory biocompatibility. In vitro evaluation indicated pinholes in the lavers, which permitted contact b etween the underlying metal and the ions iir a saline solution. In viv o evaluation revealed slight inflammatory; responses, probably indicat ive of impurities in the ceramic layers.