MICROSTRUCTURING OF MOLECULARLY THIN POLYMER LAYERS BY PHOTOLITHOGRAPHY

Authors
PRUCKER O SCHIMMEL M TOVAR G KNOLL W RUHE J
Citation
O. Prucker et al., MICROSTRUCTURING OF MOLECULARLY THIN POLYMER LAYERS BY PHOTOLITHOGRAPHY, Advanced materials, 10(14), 1998, pp. 1073
Citations number
28
Categorie Soggetti
Material Science
Journal title
Advanced materials → ACNP
ISSN journal
09359648
Volume
10
Issue
14
Year of publication
1998
Database
ISI
SICI code
0935-9648(1998)10:14<1073:MOMTPL>2.0.ZU;2-E
Abstract
Communication: Laterally structured ultrathin polymer films attached t o solid surfaces can be obtained using photolithographic techniques de veloped for electronic device fabrication. The Figure shows a surface plasmon (SP) microscopy image of a structured polystyrene (PS) film of 21.5 nm thickness prepared by photopolymerization. The authors report a strong adhesion of the polymer films to the substrate due to covale nt linking.