METAL-ORGANIC CVD OF COBALT THIN-FILMS USING COBALT TRICARBONYL NITROSYL

Citation
Pa. Lane et al., METAL-ORGANIC CVD OF COBALT THIN-FILMS USING COBALT TRICARBONYL NITROSYL, CHEMICAL VAPOR DEPOSITION, 4(5), 1998, pp. 183
Citations number
24
Categorie Soggetti
Materials Science, Coatings & Films",Electrochemistry,"Physics, Condensed Matter
Journal title
ISSN journal
09481907
Volume
4
Issue
5
Year of publication
1998
Database
ISI
SICI code
0948-1907(1998)4:5<183:MCOCTU>2.0.ZU;2-1
Abstract
The combination of Cu and Co in giant magnetoresistance (GMR) structur es is something of great interest. Here the same precursor is used as in the previous paper, but for deposition of Co rather than an oxide. Shiny, adherent films can be formed on a range of substrates. SEM anal ysis shows that the layers are polycrystalline with equiaxial grains ( see Figure). Resistivity is reported to be comparable with that of bul k Co.