NONFERROELECTRIC EPITAXIAL SR-BI-TA OXIDE THIN-FILM WITH A HIGH DIELECTRIC-CONSTANT

Citation
Sj. Hyun et al., NONFERROELECTRIC EPITAXIAL SR-BI-TA OXIDE THIN-FILM WITH A HIGH DIELECTRIC-CONSTANT, Applied physics letters, 73(17), 1998, pp. 2518-2520
Citations number
11
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
73
Issue
17
Year of publication
1998
Pages
2518 - 2520
Database
ISI
SICI code
0003-6951(1998)73:17<2518:NESOTW>2.0.ZU;2-#
Abstract
Two kinds of epitaxial Sr-Bi-Ta oxides were grown on La0.5Sr0.5CoO3 (0 01)/LaAlO3 (001) substrates by pulsed laser deposition. At a temperatu re higher than 650 degrees C, c- axis oriented SrBi2Ta2O9 films could be deposited epitaxially. At 550 degrees C, an epitaxial film with a c ubic fluorite-like phase could be grown. Although the film with the cu bic phase does not show ferroelectric properties, it has good electric al properties which are suitable for high capacitance applications. (C ) 1998 American Institute of Physics. [S0003-6951(98)01143-7].