INFLUENCE OF TARGET SHAPE ON PROPERTIES OF ALN SPUTTERED FILM

AlN films were deposited by reactive magnetron sputtering with a roof- shaped Al target and conventional planar target. The c-axis orientatio n and the grain growth of ALN films were improved and the defects in t he film were decreased, when the ion Bur bombarding the film decreased . This trend was confirmed by depositing AIN films under various N-2 g as pressures or external magnetic fields. These data indicate that the re remains a considerable influence of ion bombardment in conventional planar magnetron sputtering, but the use of a rooftype target is effe ctive for decreasing the exposure of the film to plasma as a result of a decrease in ion bombardment.