A HIGH OPTICAL-GAIN BETA-SIC BULK-BARRIER PHOTOTRANSISTOR FOR HIGH-TEMPERATURE APPLICATIONS

Citation
Kh. Wu et al., A HIGH OPTICAL-GAIN BETA-SIC BULK-BARRIER PHOTOTRANSISTOR FOR HIGH-TEMPERATURE APPLICATIONS, IEEE photonics technology letters, 10(11), 1998, pp. 1611-1613
Citations number
7
Categorie Soggetti
Optics,"Physics, Applied
ISSN journal
10411135
Volume
10
Issue
11
Year of publication
1998
Pages
1611 - 1613
Database
ISI
SICI code
1041-1135(1998)10:11<1611:AHOBBP>2.0.ZU;2-B
Abstract
A high optical-gain beta-SiC phototransistor (PT) with a bulk-barrier structure has been fabricated on a silicon substrate. It demonstrated high optical gains of 145 at 25 degrees C and 106 at 250 degrees C, un der a 10-V bias and 10-mu W incident optical power with a wavelength o f 500 nm. The high optical gains at elevated temperatures are attribut ed to not only the excellent high-temperature properties of SIC materi als, but also the bulk-barrier structure, in which the formed potentia l barrier, the short base region and an effect of thinning the quasi-n eutral base region to zero thickness lead to a greatly enhanced curren t gain. The developed beta-SiC built-barrier PT possesses a potential for high-temperature high-gain optical-sensing applications.