A. Zwick et R. Carles, MULTIPLE-ORDER RAMAN-SCATTERING IN CRYSTALLINE AND AMORPHOUS-SILICON, Physical review. B, Condensed matter, 48(9), 1993, pp. 6024-6032
Raman-scattering measurements have been performed on c-Si and a-Si ove
r a wide range of frequencies, including Stokes and anti-Stokes sides,
and up to fourth order. All the features are accounted for by using t
he same physical parameters in both phases. In particular, it is shown
that multiple-order scattering processes are not negligible, but rath
er of the same order of magnitude as first-order processes. In amorpho
us materials, light-scattering excess, spurious background, Boson-peak
or hot-luminescence processes, which have been recently put forward,
turn out to be mainly caused by high-order Raman-scattering processes.