Plants have protective pigments absorbing destructive shortwave radiat
ion. These pigments have been found in the epidermis and mesophyll of
leaves. We studied the absorption characteristics of the leaf cuticle,
the outermost part of the epidermis that is directly exposed to radia
tion. Adaxial leaf cuticles of apple, pear, sour cherry, strawberry, c
auliflower, sugarbeet, and 13 other plant species were tested. The UV-
B absorption was highest in Citrus aurantium and Citrus maxima (<3 % t
ransmittance) and lowest in sugarbeet and peach (>64 % transmittance).
The absorption maxima are at wavelenghts below 320 nm. Significant ab
sorption was also determined at 500 nm, which correlated with cuticle
thickness of the plant species (r(2)=0.72). The absorption in the rang
e of 250 to 350 nm is caused by pigments with a high extinction coeffi
cient. This absorption is species dependent and the patterns were desi
gnated to three different types. The highest absorption was found in e
vergreen species. The extraction of cuticular waxes had little effect
on absorption. The specific absorption of shortwave radiation by plant
cuticles is probably caused by pigments covalently bound to cutin. It
is known for some plant species that cuticles can contain the phenoli
cs p-coumaric acid, ferulic acid, and vanillic acid. Mixtures of these
phenolics had spectra similar to cuticles. For most species absorptio
n of shortwave radiation by the cuticle alone does not give complete p
rotection.