Ij. Bahl et al., LOW-LOSS MULTILAYER MICROSTRIP LINE FOR MONOLITHIC MICROWAVE INTEGRATED-CIRCUITS APPLICATIONS, INTERNATIONAL JOURNAL OF RF AND MICROWAVE COMPUTER-AIDED ENGINEERING, 8(6), 1998, pp. 441-454
This paper describes the multilayer microstrip structure using low die
lectric constant polyimide as a buffer layer between the microstrip co
nductor and the GaAs substrate to reduce dissipation loss, especially
for very high-impedance microstrip lines. The new structure provides a
bout half the dissipation loss and about 40% higher characteristic imp
edance in comparison to the conventional microstrip line on GaAs subst
rate having the same conductor widths. An empirical formula for the eq
uivalent dielectric constant compatible with commercial computer-aided
design tools was developed to design monolithic microwave integrated
circuits (MMICs) using this medium. The multilayer microstrip structur
e is compatible with ITT's 4 '' MSAG(R) process which uses polyimide f
or crossovers and scratch protection. The present structure has great
potential in realizing low loss and wideband matching networks includi
ng low noise, high power, and high efficiency amplifiers, and passive
components on GaAs substrate with improved insertion loss and bandwidt
h performance, and three-dimensional MMICs. (C) 1998 John Wiley & Sons
, Inc.