Ln. Tong et al., MAGNETIC AND TRANSPORT-PROPERTIES OF SPUTTERED FE SI MULTILAYERS/, The European Physical Journal. B: Condensed Matter Physics, 5(1), 1998, pp. 61-66
The structural, magnetic and transport properties of sputtered Fe/Si m
ultilayers were studied. The analyses of the data of the X-ray diffrac
tion, resistance and magnetic measurements show that heavy atomic inte
rdiffusion between Fe and Si occurs, resulting in multilayers of diffe
rent complicated structures according to different sublayer thicknesse
s. The nominal Fe layers in the multilayers generally consist of Fe la
yers doped with Si; ferromagnetic Fe-Si silicide layers and nonmagneti
c Fe-Si silicide interface layers, while the nominal Si spacers turn o
ut to be Fe-Si compound layers with additional amorphous Si sublayers
only under the condition either t(Si) greater than or equal to 3 nm fo
r the series [Fe(3 nm)/Si(t(Si))](30) or t(Fe) < 2 nm for the series [
Fe(t(Fe))/Si(1.9 nm)](30) multilayers. A strong antiferromagnetic (AFM
) coupling and negative magnetoresistance (MR) effect, about 1%, were
observed only in multilayers with iron silicide spacers and disappeare
d when alpha-Si layers appear in the spacers. The dependences of MR on
t(Si) and on bilayer numbers N resemble the dependence of AFM couplin
g. The increase of MR ratio with increasing N is mainly attributed to
the improvement of AFM coupling for multilayers with N. The t(Fe) depe
ndence of MR ratio is similar to that in metal/metal system with predo
minant bulk spin dependent scattering and is fitted by a phenomenologi
cal formula for GMR. At 77 K both the MR effect and saturation field H
-s increase. All these facts suggest that the mechanisms of the AFM co
upling and MR effect in sputtered Fe/Si multilayers are similar to tho
se in metal/metal system.