ON THE SURFACE-MORPHOLOGY OF C-N FILMS DEPOSITED BY PULSED CATHODIC ARC-DISCHARGE METHOD

The surface morphology of C:N films deposited by a pulsed cathodic are discharge (PCAD) method at nitrogen pressure in the range of 0.2-15 P a was studied by atomic force microscopy (AFM). The roughness paramete r R-a was found to be changed from 0.25-0.30 nm for nitrogen-free film to 1.55-1.60 nm for C:N film with 40 at.% of the nitrogen content at P-N2 = 1-2 Pa. The further increase of P-N2 up to 15 Pa results in loc ally non-uniform surface morphology. It is assigned to the formation o f a polymeric phase in the film. The correlation of the surface morpho logy and chemical bonding in PCAD C:N films is discussed. (C) 1998 Els evier Science B.V. All rights reserved.