NONVOLATILE MEMORY EFFECTS IN NITROGEN-DOPED TETRAHEDRAL AMORPHOUS-CARBON THIN-FILMS

Citation
Eg. Gerstner et Dr. Mckenzie, NONVOLATILE MEMORY EFFECTS IN NITROGEN-DOPED TETRAHEDRAL AMORPHOUS-CARBON THIN-FILMS, Journal of applied physics, 84(10), 1998, pp. 5647-5651
Citations number
15
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
84
Issue
10
Year of publication
1998
Pages
5647 - 5651
Database
ISI
SICI code
0021-8979(1998)84:10<5647:NMEINT>2.0.ZU;2-5
Abstract
Electrical measurements of nitrogen doped tetrahedral amorphous carbon (ta-C:N) thin films have revealed a reversible nonvolatile memory eff ect, related to the excitation and de-excitation of electrons between deep acceptor states and shallow donor states within the mobility gap. This effect is characterized by changes in the small signal film cond uctivity of up to 10 times, and has been used to fabricate 1-bit memor y cells with effective memory retention times in the order of several months. (C) 1998 American Institute of Physics. [S0021-8979(98)05522-4 ].