We investigated two simple SOS growth models where the roughness of th
e profile is softened by surface relaxation or by refuse. In the first
case, a particle can relax until it reaches a local minimum and this
process is described by a linear equation. In the second case, a parti
cle can be evaporated and this process is described by the KPZ equatio
n. In this work, we have mixed both the models in the same growth proc
ess. Numerical simulations in (1+1)-dimensions show a process that for
short times behaves as the surface relaxation model and for intermedi
ate times, behaves as the refuse model. Numerical simulations indicate
for this crossover a dynamical exponent z approximate to 1.4, indicat
ing that it is in the KPZ universality class.