EFFECT OF STRESS STATE OF DIFFERENT TIN FILMS ON THEIR TRIBOLOGICAL BEHAVIOR

Authors
ZHUANG DM LIU JJ ZHU BL ZHOU ZR VINCENT L KAPSA P
Citation
Dm. Zhuang et al., EFFECT OF STRESS STATE OF DIFFERENT TIN FILMS ON THEIR TRIBOLOGICAL BEHAVIOR, Journal of tribology, 120(4), 1998, pp. 820-828
Citations number
27
Categorie Soggetti
Engineering, Mechanical
Journal title
Journal of tribology → ACNP
ISSN journal
07424787
Volume
120
Issue
4
Year of publication
1998
Pages
820 - 828
Database
ISI
SICI code
0742-4787(1998)120:4<820:EOSSOD>2.0.ZU;2-T
Abstract
Titanium nitride films were deposited by the methods of ion beam enhan ced deposition (IBED), plasma chemical vapor deposition (PCVD) and ion plating (IP). X-ray diffraction analysis was employed to determine th e internal stress state of TiN film and 52100 steel substrate at both sines of the interface. The effect of stress state on their bonding st rength and tribological behavior was analyzed systematically, their we ar and failure mechanisms were discussed in detail as well.