Y. Soutome et al., CHARACTERIZATION OF YBA2CU3O7-X COPLANAR JOSEPHSON-JUNCTIONS USING FOCUSED ION-BEAM, IEICE transactions on electronics, E81C(10), 1998, pp. 1538-1543
YBa2Cu3O7-delta co-planar Josephson junctions by Focused Ion Beam were
characterized by changing the thickness of YBa2Cu3O7-delta films. The
junctions had the thickness dependence of the characteristics. The ch
aracteristics were dominantly divided into two types. One had the I-V
curve of a Aux-flow junction and a weak magnetic response. The other h
ad the I - V curve of RSJ, the IcRn product from 0.1 mV to 0.5 mV at 4
.2 K, and a good magnetic response. The critical current density of th
e junctions increased exponentially with increasing film thickness. Fr
om the observation of the junction surface, the junction length was de
creased with increasing film thickness by the horizontal growth of the
normally grown YBaCuO. In the thicker film (above 240 nm), the micros
horts of the normally grown YBaCuO on the abnormally grown YBaCuO area
were observed. It is considered that the main part of Josephson curre
nt for the junctions changes from the abnormally grown YBaCuO to micro
shorts when increased with the film thickness.