Be is the preferred acceptor dopant for InP in beam epitaxial systems.
We show that the carrier concentration of Be-doped InP (100) can be c
ompensated by more than four orders of magnitude by diffusion of atomi
c hydrogen generated by an electron cyclotron resonance plasma source.
Capacitance-voltage depth profiling shows effective compensation of t
he carriers within the first 0.4 mu m from the surface. The dissociati
on energy of the Be-H complex is determined from the reactivation kine
tics of the passivated Be acceptor in a back-to-back Schottky diode. T
he significantly large dissociation energy of 2.57 eV found here sugge
sts the use of hydrogenation as an alternative isolation technique. (C
) 1998 Published by Elsevier Science B.V. All rights reserved.