HYDROGEN PASSIVATION OF THE BE ACCEPTOR IN P-INP (100)

Citation
Md. Williams et al., HYDROGEN PASSIVATION OF THE BE ACCEPTOR IN P-INP (100), Applied surface science, 136(1-2), 1998, pp. 111-116
Citations number
12
Categorie Soggetti
Physics, Applied","Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
ISSN journal
01694332
Volume
136
Issue
1-2
Year of publication
1998
Pages
111 - 116
Database
ISI
SICI code
0169-4332(1998)136:1-2<111:HPOTBA>2.0.ZU;2-1
Abstract
Be is the preferred acceptor dopant for InP in beam epitaxial systems. We show that the carrier concentration of Be-doped InP (100) can be c ompensated by more than four orders of magnitude by diffusion of atomi c hydrogen generated by an electron cyclotron resonance plasma source. Capacitance-voltage depth profiling shows effective compensation of t he carriers within the first 0.4 mu m from the surface. The dissociati on energy of the Be-H complex is determined from the reactivation kine tics of the passivated Be acceptor in a back-to-back Schottky diode. T he significantly large dissociation energy of 2.57 eV found here sugge sts the use of hydrogenation as an alternative isolation technique. (C ) 1998 Published by Elsevier Science B.V. All rights reserved.