Yl. Leung et al., X-RAY PHOTOELECTRON-SPECTROSCOPY STUDIES OF THE REDUCTION OF MOO3 THIN-FILMS BY NH3, Applied surface science, 136(1-2), 1998, pp. 147-158
Citations number
33
Categorie Soggetti
Physics, Applied","Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
X-ray photoelectron spectroscopy (XPS) has been used to gain insight i
nto surface reaction pathways associated with the nitridation by NH3 o
f MoO3 thin films grown on metallic substrates. The samples formed can
be seen as model hydrodenitrogenation (HDN) catalysts, but the more-c
ontrolled surface morphology allows spectral features to be studied in
the absence of charging effects that can interfere with such measurem
ents on high-area samples. Observed core level and valence spectra are
consistent with the MoO3 being reduced, but the degree of reduction d
epends on the reaction temperature. Heating to 350 degrees C indicates
some conversion to Mo(+5) and 'O-rich' Mo(+4) components, while heati
ng to 450 degrees C and to 700 degrees C give respectively a 'N-rich'
Mo(+4) form and a Mo(+3) oxynitride as the dominant components. It is
concluded that the nitridation of MoO3 by NH3 involves initial hydroge
nation, with subsequent elimination of water, and the effective replac
ement of O by N as the reduction continues. Surface compositions deter
mined here during the nitridation process contrast with conclusions re
ached previously for the evolution of bulk phases as deduced by X-ray
diffraction. (C) 1998 Elsevier Science B.V. All rights reserved.