SEM INVESTIGATION OF PILLARED MICROSTRUCTURES FORMED BY ELECTROCHEMICAL ANODIZATION

The results of SEM investigations of structured (pillared) layers form ed by electrochemical processing of Al-Ta thin film sandwiches are pre sented. The basic parameters of the internal microstructure and ''natu ral'' morphology of Al anodic oxide films and pillared structured laye rs formed on them are given. Two methods of multistep electrochemical processing of aluminum films during porous anodic oxide films formatio n were developed to improve the morphology of pillared microstructures . Analysis of experimental data shows that the developed methods allow us to obtain the ordered pillared microstructures with high aspect ra tio (greater than or equal to 4), radius 15 to 35 nm, and pillar densi ty (3.0 to 8.5) x 10(9) cm(-2). High reproducibility of physical and m orphological parameters of the structured layers for large area sample s is achieved. Such pillared matrices can be used for manufacturing of the microelements based on the mesoscopic and quantum effects: solar cells, controlled and uncontrolled emitter matrices for flat panel dis plays and emission cathodes, cathode luminescent displays, functional screens and polarizers for optoelectronics, etc.