STRUCTURAL AND ELECTRICAL-PROPERTIES OF CATHODIC SPUTTERED THIN CHROMIUM FILMS

Films with a thickness of about 150-1500 nm are deposited on ceramic s ubstrates in Ar, N-2, air and Ar + O-2 (30%) atmospheres using the cat hodic sputtering technique. The formation of chromium oxides and nitri des in the films during reactive deposition is confirmed by X-ray diff raction investigations. The temperature-dependent electrical resistivi ty is measured in the temperature range of 4-500 K, and the temperatur e coefficient of resistivity 1/rho x (d rho/dT) is determined. The var iations in electrical properties of the films are compared with the va riations in structure and chemical composition, and it is shown that t he greatest resistance with TCR dose to zero can be obtained in films containing granules with metallic and non-metallic conductivity. (C) 1 998 Elsevier Science S.A. All rights reserved.