SPUTTERING-ATOMIZING AND OPTOGALVANIC PROPERTIES OF AN AR-MG HOLLOW-CATHODE DISCHARGE

Citation
D. Zhechev et S. Atanassova, SPUTTERING-ATOMIZING AND OPTOGALVANIC PROPERTIES OF AN AR-MG HOLLOW-CATHODE DISCHARGE, Vacuum, 51(2), 1998, pp. 85-88
Citations number
14
Categorie Soggetti
Physics, Applied","Material Science
Journal title
VacuumACNP
ISSN journal
0042207X
Volume
51
Issue
2
Year of publication
1998
Pages
85 - 88
Database
ISI
SICI code
0042-207X(1998)51:2<85:SAOPOA>2.0.ZU;2-A
Abstract
The atomisation and optogalvanic (OG) properties of Ar-Mg a hollow cat hode discharge (HCD) plasma are analysed. Under operating conditions o f an Ar gas pressure of 39.8 Pa and a discharge current of 10 mA the r eal sputtering coefficient and the density of the magnesium atoms are calculated to be S-k = 3 x 10(-2) atoms per ion and 1.45 x 10(11) cm(- 3) respectively. The characteristics and a new point of view of the OG signal from the Ar+ ion are discussed. (C) 1998 Elsevier Science Ltd. All rights reserved.