INFLUENCE OF THE VACUUM DEPOSITION CONDITIONS ON THE MICROSTRUCTURE OF THIN AS-S FILMS

The preparation of crystalline As-S films have been studied and some b asic experimental conditions for epitaxial growth applied. Films were deposited from As2S3 vacuum evaporated from a Ta-crucible on air cleav ed NaCl single crystal and Ca-Na silicate glass. It was established th at condensation of As2S3 on air-cleaved NaCl single crystals at very l ow deposition rates resulted in thin films with a crystalline microstr ucture. The composition of the crystalline phase differs from the stoi chiometric As/S ratio and strongly depends on the film thickness, depo sition rate, type and substrate temperature. From the results obtained the importance is discusses' of the vacuum deposition conditions need ed to prepare thin films with desired structural characteristics. (C) 1998 Elsevier Science Ltd. All rights reserved.