EFFECTS OF SUBSTRATE-TEMPERATURE AND ION IRRADIATION ON THE FORMATIONAND STRUCTURE OF CO FILMS ON NACL(100)

The effects of substrate temperature and ion irradiation on the format ion and the structure of thin Co films during vacuum deposition onto a ir-cleaved NaCl(100) single crystal surfaces were investigated using t ransmission electron microscopy (TEM). Both rise in the substrate temp erature and the ion irradiation, caused considerable changes in averag e grain size, structure and orientation oft he Co films. In particular , a well pronounced cubic (fcc) phase was establish ed from ion irradi ation, whereas the physical vapour deposited room Temperature Co films without ion irradiation show a hexagonal (hcp) structure. The effects of ion irradiation during the growth of Co films on NaCl(100) substra te at room temperature were found to be identical to the effects of ra ising the substrate temperature to the range of 80 degrees C-90 degree s C during the physical vapour deposition. (C) 1998 Elsevier Science L td. All rights reserved.