DEVELOPMENT OF A LASER-BEAM WRITING SYSTEM FOR CONTINUOUS PATTERNING OF SUBSTRATES WITH DIFFERENT REFLECTANCE

In this report, we describe a laser beam writing system developed by u s. The system is suitable for writing patterns on the order of several micrometers in a maskless manner. To make optical waveguides (LiNbO3) efficiently, we adopted a specially designed holder and improved the algorithm of the autofocus control. Such improvements made it possible to pattern substrates with different reflectance. Moreover, to make a n arbitrary design of the pattern linewidth possible, a multiple regre ssion equation derived from multiple regression analysis was used. It was found that the multiple regression equation produces patterns in g ood agreement with the design values. (C) 1998 Scripta Technica, Elect ron Comm Jpn Pt 2, 81(9): 38-45, 1998.