DIRECT MEASUREMENT OF THE OSCILLATION AMPLITUDE AND CRITERIA FOR HIGH-QUALITY IMAGES IN SHEAR FORCE MICROSCOPY

Citation
H. Bruckl et al., DIRECT MEASUREMENT OF THE OSCILLATION AMPLITUDE AND CRITERIA FOR HIGH-QUALITY IMAGES IN SHEAR FORCE MICROSCOPY, Applied physics A: Materials science & processing, 66, 1998, pp. 345-348
Citations number
15
Categorie Soggetti
Physics, Applied
ISSN journal
09478396
Volume
66
Year of publication
1998
Part
1
Supplement
S
Pages
345 - 348
Database
ISI
SICI code
0947-8396(1998)66:<345:DMOTOA>2.0.ZU;2-S
Abstract
While the origins of the physical mechanisms are still under discussio n, shear force is widely used in near-field scanning optical microscop es as an independent distance control. In this paper we present invest igations of one of the most crucial parameters influencing the quality of topographic images in shear force microscopy, namely the force its elf. With metal probes the tunneling and contact current was measured during the distance regulation by shear force on conducting samples. I t is demonstrated how the true oscillation amplitude can be determined directly by this configuration. By evaluating tip-sample distance cur ves conclusions are drawn about the interaction mechanisms between the oscillating tip and the sample, leading to the shear forces. It is sh own that high quality images are yielded if the shear force is minimum , but dominated by the mechanical contact in the ''knocking'' regime. Furthermore, a new, faster and more economic electronics for processin g of the shear force signal will be introduced, replacing the common l ock-in technique.