IMAGING INSULATING OXIDES BY ELEVATED-TEMPERATURE STM

Citation
Mr. Castell et al., IMAGING INSULATING OXIDES BY ELEVATED-TEMPERATURE STM, Applied physics A: Materials science & processing, 66, 1998, pp. 963-967
Citations number
13
Categorie Soggetti
Physics, Applied
ISSN journal
09478396
Volume
66
Year of publication
1998
Part
2
Supplement
S
Pages
963 - 967
Database
ISI
SICI code
0947-8396(1998)66:<963:IIOBES>2.0.ZU;2-Z
Abstract
By using elevated-temperature scanning tunnelling microscopy (STM) we have imaged the UO2(111), UO2(110), and NiO(001) surfaces, and have ob tained atomic resolution data that are comparable in quality with imag es of other oxides that can be imaged at room temperature. Electronic structure modelling is used to interpret the STM images. On the UO2(11 1) surface we image the U sites in empty states, and it is also possib le to observe interstitial oxygen on this surface that packs into a (r oot 3 x root 3) R 30 degrees oxygen overlayer. The UO2(110) surface ha s been imaged at atomic resolution and displays a row structure commen surate with the (1 x 1) bulk termination. On NiO(001), Ni and O sites are imaged in empty and filled states, respectively, which is demonstr ated by comparing the lattices around characteristic defect sites.