Y. Robach et al., STRAIN-INDUCED FORMATION OF SELF-ASSEMBLED NANOSTRUCTURES IN THE EPITAXIAL-GROWTH OF INAS AND GAAS ON INP(001), Applied physics A: Materials science & processing, 66, 1998, pp. 1031-1034
The evolution of surface morphology in epitaxial InAs and GaAs straine
d layers grown on InP(001) was investigated by scanning tunneling micr
oscopy. For compressive InAs layers, well-defined nanowires were forme
d at the onset of the 2D/3D growth mode transition. These wires have b
ase width and height distributions peaked at around 230 Angstrom and 2
0 Angstrom, respectively. The sharp 2D/3D transition is associated wit
h a large reorganization of matter. In contrast, for tensile GaAs laye
rs the growth mode is characterized by a gradual roughening process.