FINE PATTERNING AND CHARACTERIZATION OF GEL FIRMS DERIVED FROM METHYLTRIETHOXYSILANE AND TETRAETHOXYSILANE

Citation
A. Matsuda et al., FINE PATTERNING AND CHARACTERIZATION OF GEL FIRMS DERIVED FROM METHYLTRIETHOXYSILANE AND TETRAETHOXYSILANE, Journal of the American Ceramic Society, 81(11), 1998, pp. 2849-2852
Citations number
16
Categorie Soggetti
Material Science, Ceramics
ISSN journal
00027820
Volume
81
Issue
11
Year of publication
1998
Pages
2849 - 2852
Database
ISI
SICI code
0002-7820(1998)81:11<2849:FPACOG>2.0.ZU;2-M
Abstract
Pregrooves of 1.6 mu m pitch for optical data storage have been emboss ed successfully by pressing a stamper against xCH(3)Si(OC2H5)(3).(100 - x)Si(OC2H5)(4)-derived gel films (60 less than or equal to x less th an or equal to 100 mol%) on glass-disk substrates of 130 mm diameter. When x is <40 mol%, the resultant films are too hard to emboss pattern s uniformly. The shrinkage of the patterns is similar to 4% for all th e films when 60 less than or equal to x less than or equal to 100 mol% , even after heat treatment at 350 degrees C, so that the nearly net n egative shape of the stamper is preserved. The methyl groups in the fi lms decompose at temperatures from 500 degrees to 600 degrees C.