Kc. Wong et al., HOMOLYSIS VERSUS BETA-HYDRIDE ELIMINATION IN THE DECOMPOSITION OF TRIALKYLGALLIUM ON GAAS(100), Surface science, 416(3), 1998, pp. 480-487
The decomposition of various surface alkyl groups on GaAs(100), which
were generated by dissociative adsorption of the corresponding trialky
lgallium precursors R3Ga (R = Me, Et, Et-d(5), Pr-n, Pr-i, Bu-n and Bu
-t), was studied by temperature programmed desorption. Two elimination
pathways were observed, homolysis and beta-hydride elimination. The f
ormer reaction results in the formation of alkyl radicals and the latt
er gives alkene and H-2 as products. On GaAs(100), both reactions are
observed in the decomposition of all surface alkyl groups, except for
methyl that reacts by homolysis. For each surface alkyl group. homolys
is always occurs at slightly lower temperature than beta-hydride elimi
nation. Experiments with perdeuterated triethylgallium reveal that sur
face Et groups do not undergo coupling with coadsorbed deuterium on th
e surface to form ethane, and that ethane forms in subsequent wall rea
ctions that involve E-a radicals. The activation energy E-a for homoly
sis followed the trend Me > Et > Pr-n > Bu-n > Pr-i > Bu-t, which refl
ects the strength of alkyl-surface bonds as well as the increased stab
ility of the alkyl radical. The E-a for beta-hydride elimination follo
ws closely the E-a for homolysis and exhibits similar behavior in term
s of magnitude and trend, i.e. Et > Pr-n > Bu-n approximate to Pr-i >
Bu-t, suggesting that breaking the alkyl-surface bond contributes to t
he activation energy for both homolysis and beta-hydride elimination r
eactions. The alkyl-sulface bond energy (Delta N-h) and the heat of re
action for beta-hydride elimination (Delta H-beta) for all surface alk
yls are calculated from the desorption temperatures of their products.
(C) 1998 Elsevier Science B.V. All rights reserved.