LASER DIRECT-WRITE GRAY-LEVEL MASK AND ONE-STEP ETCHING FOR DIFFRACTIVE MICROLENS FABRICATION

Authors
Citation
Mr. Wang et H. Su, LASER DIRECT-WRITE GRAY-LEVEL MASK AND ONE-STEP ETCHING FOR DIFFRACTIVE MICROLENS FABRICATION, Applied optics, 37(32), 1998, pp. 7568-7576
Citations number
19
Categorie Soggetti
Optics
Journal title
ISSN journal
00036935
Volume
37
Issue
32
Year of publication
1998
Pages
7568 - 7576
Database
ISI
SICI code
0003-6935(1998)37:32<7568:LDGMAO>2.0.ZU;2-L
Abstract
High-efficiency diffractive optical elements can be achieved by an inc rease in the number of phase levels. We present a technique for laser direct-write gray-level masks on high-energy-beam-sensitive glass and one-step etching on the gray-level mask plate for the production of hi gh-efficiency diffractive optical elements. Sixteen-phase-level diffra ctive microlenses and microlens arrays with a focusing efficiency of a pproximately 94% have been realized by use of the one-step nonphotolit hographic fabrication technique. (C) 1998 Optical Society of America.