SPATIAL CHARACTERIZATION OF DOPED SIC WAFERS BY RAMAN-SPECTROSCOPY

Raman spectroscopy has been used to investigate wafers of both 4H-SiC and 6H-SiC. The wafers studied were semi-insulating and n-type (nitrog en) doped with concentrations between 2.1 x 10(18) and 1.2 x 10(19) cm (-3). Significant coupling of the A(1) longitudinal optical (LO) phono n to the plasmon mode was observed. The position of this peak shows a direct correlation with the carrier concentration. Examination of the Raman spectra from different positions on the wafer yielded a rudiment ary spatial map of the carrier concentration. These data are compared with a resistivity map of the wafer. These results suggest that Raman spectroscopy of the LO phonon-plasmon mode can be used as a noninvasiv e, in situ diagnostic for SiC wafer production and substrate evaluatio n. (C) 1998 American Institute of Physics. [S0021-8979(98)03623-8].