ELECTROCHROMISM OF SPUTTER-DEPOSITED NI-CR OXIDE-FILMS

Citation
A. Azens et Cg. Granqvist, ELECTROCHROMISM OF SPUTTER-DEPOSITED NI-CR OXIDE-FILMS, Journal of applied physics, 84(11), 1998, pp. 6454-6456
Citations number
39
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
84
Issue
11
Year of publication
1998
Pages
6454 - 6456
Database
ISI
SICI code
0021-8979(1998)84:11<6454:EOSNO>2.0.ZU;2-6
Abstract
Electrochromic thin films of Ni oxide and Ni-Cr oxide were made by rea ctive dc magnetron sputtering from magnetic Ni as well as nonmagnetic Ni-Cr alloy targets, respectively. The physical and electrochemical pr operties of the two materials were similar, indicating that anodically coloring electrochromic films can be made by a standard large area de position technique. (C) 1998 American Institute of Physics. [S0021-897 9(98)03523-3].