M. Kubo et al., MOLECULAR-DYNAMICS SIMULATION ON A LAYER-BY-LAYER HOMOEPITAXIAL GROWTH-PROCESS OF SRTIO3(001), The Journal of chemical physics, 109(19), 1998, pp. 8601-8606
The effect of substrate temperature on the homoepitaxial growth proces
s of a SrTiO3(001) surface has been investigated using our crystal gro
wth molecular dynamics simulation code. SrO molecules were continuousl
y deposited one by one on the SrTiO3(001) surface terminated by TiO2 a
tomic plane at 300 K. Two-dimensional and epitaxial growth of a SrO th
in layer was observed on the SrTiO3(001) surface retaining perovskite
type structure and (001) oriented configuration. However, some defects
were constructed in the grown film at a low temperature of 300 K, whi
ch is in significant contrast to that at 713 K. In the latter case, a
single flat and smooth SrO layer was formed without any defects, which
is in good agreement with the experimental results. The self-diffusio
n coefficient, activation energy for surface migration, and adsorption
energy of the deposited SrO molecules on the SrTiO3(001) surface were
discussed. A higher migration ability of the deposited SrO molecules
at high temperature was found to lead to complete layer-by-layer homoe
pitaxial growth. (C) 1998 American Institute of Physics. [S0021-9606(9
8)50243-7].